AR膜系-硅鋁靶材-高純3~6NSiAI-low-E鍍膜玻璃材料
價(jià)格
訂貨量(根)
¥40000.00
≥10
店鋪主推品 熱銷(xiāo)潛力款
憩憪憭憤憤憩憦憫憪憫憦
在線(xiàn)客服
安徽拓吉泰新型陶瓷科技有限公司
店齡3年 企業(yè)認(rèn)證
聯(lián)系人
吳經(jīng)理 客戶(hù)經(jīng)理
聯(lián)系電話(huà)
憩憪憭憤憤憩憦憫憪憫憦
經(jīng)營(yíng)模式
生產(chǎn)廠(chǎng)家
所在地區(qū)
安徽省合肥市
噴涂硅鋁靶材 Spray SiAl Target
產(chǎn)品說(shuō)明Product description
以等離子體為熱源,在大氣環(huán)境下通過(guò)一定的氣氛保護(hù)裝置,將Si+Al粉末加熱到熔融或半熔融狀態(tài)并高速?zèng)_擊背管表面形成致密涂層,從而制備出高純度、低氧含量、高致密度SiAl靶材。
With plasma as the heat source, high purity, low oxygen content, high density SiAl targets are produced by using Si and Al powders. The starting Si and Al powders are heated to molten or semi-molten state with the protection of certain atmosphere and sprayed on the surface of backing tube at high speeds to form dense coatings.
項(xiàng)目 Item | 參數(shù) Specifications | 檢測(cè)手段 Testing method |
純度 Purity | ≥99.9% |
|
Al含量 Al Content | 8-10% |
|
密度 Density | ≥2.2 g/cm3 |
|
雜質(zhì)含量 Impurities | Fe: ≤350 ppm Ca: ≤50 ppm Cu: ≤50 ppm Mg: ≤20 ppm Ni: ≤20 ppm O: ≤6000 ppm N: ≤500 ppm 雜質(zhì)總和(O、N除外): ≤1000 ppm Total impurity (excluding O, N) | ICP 氧氮分析儀 Oxygen and nitrogen analyzer
|
電阻率 Electrical resistivity | ≤50 mΩ?cm | 四探針電阻率儀 Four-probe resistivity meter |
背管材質(zhì) Backing tube
-選用304/316L不銹鋼(無(wú)磁)
304/316L stainless steel (non-magnetic)
靶材尺寸Dimension
-按照?qǐng)D紙要求加工
According to customized drawings
應(yīng)用領(lǐng)域Applications
-用于制作SiO2膜、Si3N4膜,主要用于光學(xué)玻璃AR膜,LOW-E鍍膜玻璃,半導(dǎo)體電子器件,TFT-LCD,平面顯示,觸摸屏玻璃。
For deposition of SiO2 and Si3N4 films, which are used for AR films of optical glasses, LOW-E glasses, electronic devices, TFT-LCD, flat panel screens, touch screen glasses.